Quick surface metallization of titania powder was carried out by electroless chemical deposition of nickel.
采用鎳的無電子化學(xué)沉積方法研究了納米二氧化鈦粉末表面的快速金屬化 。
The solving process is named as integral operator solving process, thus it is fended provide a new, simple and immediate solving process of the boundary value problems of abstract kinetic equations.
將一類抽象Volterra型線性積分算子用于求解抽象動(dòng)力方程邊值問題 ,此方法稱為積分算子求解法 。
We have obtained the solution of the boundary value problem of the abstract kinetic equation with a control parameter and reflecting boundary condition by integral operator solving process.
用積分算子求解法 ,得到了具有反射邊界條件的、含控制參數(shù)的抽象動(dòng)力方程邊值問題的解。
The new solving process is named as integral operator solving process.
這種新的求解法我們稱為積分算子求解
Hydrogen dissociation during the electron assisted chemical vapor deposition (EACVD) of diamond thin film is simulated by using the Monte Carlo method.
采用蒙特卡羅方法模擬了電子輔助化學(xué)氣相淀積 (EACVD)金剛石薄膜中的氫分解過程 ,建立了電子碰撞使氫分解的模型 ,給出了電子能量分布及氫原子數(shù)的空間分布 ,討論了電偏壓和氣壓對(duì)氫分解的影響。
The Research on the Gas Phase Process of Electron-Assisted Chemical Vapor Deposition from CH_4/H_2 Mixture Gas;
CH_4/H_2系統(tǒng)電子助進(jìn)化學(xué)氣相沉積氣相過程研究
Dynamics of EACVD in H_2/C_2H_2;
H_2/C_2H_2系統(tǒng)電子助進(jìn)熱絲化學(xué)氣相沉積動(dòng)力學(xué)過程研究
Deposition of Al_2O_3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method
靜電輔助氣溶膠化學(xué)氣相沉積法制備Al_2O_3薄膜
Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method
靜電輔助的氣溶膠化學(xué)氣相沉積法制備Y_2O_3薄膜
plasma activated chemical vapour deposition
等離子體化學(xué)氣相沉積
The Preparation of Nanocrystalline Diamond Films by Electron Assisted Chemical Vapor Deposition (EACVD) and the Researches on the Photo-electric Properties;
電子輔助化學(xué)氣相沉積法（EACVD）制備納米金剛石薄膜及其光電性能的研究
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method
射頻輝光放電等離子體輔助化學(xué)氣相沉積法制備類金剛石碳膜工藝與性能表征
TEM Study on Diamond Films Deposited by MPCVD;
微波等離子體化學(xué)氣相沉積金剛石薄膜的電子顯微學(xué)分析
thermally activated chemical vapour deposition
熱活化化學(xué)氣相沉積
Application of chemical vapor deposition for electrode materials of lithium ion batteries
化學(xué)氣相沉積技術(shù)在鋰離子電池電極材料中的應(yīng)用
Preparation of Amorphous Silicon Nitride Film by ECRCVD;
用電子回旋共振化學(xué)氣相沉積(ECRCVD)方法制備非晶態(tài)氮化硅薄膜
epitaxial CVD growth
外延化學(xué)氣相沉積生長(zhǎng)
Charge collection efficiency of chemical vapor deposition diamond film detector to alpha-particles
化學(xué)氣相沉積金剛石薄膜探測(cè)器對(duì)α粒子的電荷收集效率
Progress in EB-PVD Thermal Barrier Coatings
電子束物理氣相沉積熱障涂層技術(shù)研究進(jìn)展
Quantum chemistry methods and their applications to CVD reaction system
化學(xué)氣相沉積反應(yīng)研究的量子化學(xué)方法及應(yīng)用
Principle and research development of powder materials prepared by chemical vapor deposition
化學(xué)氣相沉積制備粉體材料的原理及研究進(jìn)展
Atomization and Deposition Characteristic Research on Air-assisted Electrostatic Spraying
氣助式靜電噴霧霧化及沉積特性研究
Improved quality of polycrystalline diamond grown by two-stage growth in microwave plasma chemical vapor deposition
兩段成長(zhǎng)法改善微波電漿輔助化學(xué)氣相沉積多晶金剛石之品質(zhì)(英文)